Physical vapor deposition has opened up new possibilities in the modification of textile materials and is an exciting prospect for usage in textile design and technical textiles. The objective of this work is to give a comprehensive description and review of the science and technology related to physical vapor deposition with particular emphasis on their potential use in the textile industry. Such coatings are used in a wide range of applications such as aerospace, automotive, surgical, medical, dyes and molds for all manner of material processing, cutting tools, firearms, optics, thin films and textiles. At the same time, a reactive gas is also introduced it forms a compound with the metal vapor and is deposited on the substrate as a thin film with highly adherent coating. In the PVD method, the solid coating material is evaporated by heat or by bombardment with ions (sputtering). PVD processes include different types, such as: cathode arc deposition, electron beam physical vapor deposition, evaporative deposition, sputtering, ion plating and enhanced sputtering.

The PVD process is carried out in a vacuum. Physical vapor deposition (PVD) is a coating process in which thin films are deposited by the condensation of a vaporized form of the desired film material onto the substrate.

Shahidi, Sheila Moazzenchi, Bahareh Ghoranneviss, Mahmood A review-application of physical vapor deposition (PVD) and related methods in the textile industry

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